发明申请
- 专利标题： SUBSTRATE PROCESSING GAS, STORAGE CONTAINER, AND SUBSTRATE PROCESSING METHOD
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申请号： US17040803申请日： 2019-03-05
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公开(公告)号： US20210054275A1公开(公告)日： 2021-02-25
- 发明人: Akifumi YAO , Yuuta TAKEDA , Jun ETO
- 申请人： CENTRAL GLASS COMPANY, LIMITED
- 申请人地址： JP Yamaguchi
- 专利权人： CENTRAL GLASS COMPANY, LIMITED
- 当前专利权人： CENTRAL GLASS COMPANY, LIMITED
- 当前专利权人地址： JP Yamaguchi
- 优先权： JP2018-065433 20180329
- 国际申请： PCT/JP2019/008548 WO 20190305
- 主分类号： C09K13/00
- IPC分类号： C09K13/00 ; H01L21/3065 ; C01B7/24
摘要：
A substrate processing gas of the present invention contains IF5; and IF7, in which a content of the IF5 is equal to or more than 1 ppm and equal to or less than 2% on a volume basis with respect to a total amount of the IF5 and the IF7.