Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
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Application No.: US16952371Application Date: 2020-11-19
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Publication No.: US20210072649A1Publication Date: 2021-03-11
- Inventor: Thomas Poiesz , Bert Dirk Scholten , Dirk Willem Harberts , Lucas Henricus Johannes Stevens , Laura Maria Fernandez Diaz , Johannes Adrianus Cornelis M Pijnenburg , Abraham Alexander Soethoudt , Wilhelmus Jacobus Johannes Welters , Jimmy Matheus Wilhelmus Van De Winkel
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP18210662.5 20181206
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
Public/Granted literature
- US11269259B2 Lithographic apparatus and a device manufacturing method Public/Granted day:2022-03-08
Information query
IPC分类:
