Invention Grant
- Patent Title: Lithographic apparatus and a device manufacturing method
-
Application No.: US16952371Application Date: 2020-11-19
-
Publication No.: US11269259B2Publication Date: 2022-03-08
- Inventor: Thomas Poiesz , Bert Dirk Scholten , Dirk Willem Harberts , Lucas Henricus Johannes Stevens , Laura Maria Fernandez Diaz , Johannes Adrianus Cornelis Maria Pijnenburg , Abraham Alexander Soethoudt , Wilhelmus Jacobus Johannes Welters , Jimmy Matheus Wilhelmus Van De Winkel
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP18210662 20181206
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
Public/Granted literature
- US20210072649A1 LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD Public/Granted day:2021-03-11
Information query
IPC分类:
