A thin film manufacturing apparatus capable of forming thin films with high uniformity is provided. A thin film manufacturing apparatus capable of controlling various kinds of set conditions during thin film formation is provided. The thin film manufacturing apparatus includes a treatment chamber, a gas supply means, an evacuation means, an electric power supply means, an arithmetic portion, and a control device; the gas supply means supplies gas into the treatment chamber; the evacuation means adjusts a pressure in the treatment chamber; the electric power supply means applies voltage between electrodes provided in the treatment chamber; the arithmetic portion has a function of performing detection of an abnormal state and inference with the use of a neural network during thin film formation; and the control device controls various kinds of set conditions in accordance with results of the detection and the inference during the thin film formation.