Invention Application
- Patent Title: PLATING FILM
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Application No.: US16968351Application Date: 2019-01-28
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Publication No.: US20210087702A1Publication Date: 2021-03-25
- Inventor: Norihiro KIMOTO , Tomohiro GOTO , Kouichi UMEMOTO
- Applicant: DAICEL CORPORATION
- Applicant Address: JP Osaka-shi, Osaka
- Assignee: DAICEL CORPORATION
- Current Assignee: DAICEL CORPORATION
- Current Assignee Address: JP Osaka-shi, Osaka
- Priority: JP2018-021220 20180208,JP2018-021221 20180208,JP2018-154809 20180821,JP2019-001977 20190109,JP2019-001978 20190109
- International Application: PCT/JP2019/003762 WO 20190128
- Main IPC: C25D5/00
- IPC: C25D5/00 ; C25D3/48 ; C25D3/46 ; C25D3/50 ; C25D7/00

Abstract:
Provided is a plating film that can exhibit a high gloss and a low contact resistance value. The plating film according to an embodiment of the present invention is a plating film including a noble metal matrix and nanodiamond particles dispersed in the noble metal matrix. The plating film according to an embodiment of the present invention preferably has a gloss at an incident angle of 60° of not less than 250 GU and/or a contact resistance value at a load of 50 gf of not greater than 1 mΩ, and a difference between a contact resistance value at a load of 50 gf and a contact resistance value at a load of 5 gf of not greater than 5 mΩ. The nanodiamond particles are preferably nanodiamond particles including a surface-modifying group containing a sterically repulsive group and particularly preferably nanodiamond particles including a surface-modifying group containing a polyglycerol chain.
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