Invention Application
- Patent Title: METHOD FOR FORMING A CHEMICAL GUIDING STRUCTURE ON A SUBSTRATE AND CHEMOEPITAXY METHOD
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Application No.: US16954875Application Date: 2018-12-21
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Publication No.: US20210088897A1Publication Date: 2021-03-25
- Inventor: Raluca TIRON , Florian DELACHAT , Ahmed GHARBI , Xavier CHEVALIER , Christophe NAVARRO , Anne PAQUET
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR PARIS
- Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: FR PARIS
- Priority: FR1762874 20171221
- International Application: PCT/EP2018/086594 WO 20181221
- Main IPC: G03F7/00
- IPC: G03F7/00 ; C08F212/08 ; C08F299/02
Abstract:
A method for forming a chemical guiding structure intended for the self-assembly of a block copolymer by chemoepitaxy, includes forming on a substrate at least one initial pattern made of a first grafted polymer material having a first molar mass and a first chemical affinity with respect to the block copolymer; covering the initial pattern and a region of the substrate adjacent to the initial pattern with a layer including a second graftable polymer material, the second polymer material having a second molar mass, greater than the first molar mass, and a second chemical affinity with respect to the block copolymer, different from the first chemical affinity; and grafting the second polymer material in the region adjacent to the initial pattern.
Information query
