Invention Application
- Patent Title: TECHNIQUES FOR FORMING SEMICONDUCTOR DEVICE PACKAGES AND RELATED PACKAGES, INTERMEDIATE PRODUCTS, AND METHODS
-
Application No.: US16578975Application Date: 2019-09-23
-
Publication No.: US20210091036A1Publication Date: 2021-03-25
- Inventor: Po Chih Yang , Yu Jen Chen , Po Chen Kuo , Shih Wei Liang
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/768 ; H01L21/56 ; H01L23/31 ; H01L25/065

Abstract:
Semiconductor device packages may include a first semiconductor device over a substrate and a second semiconductor device over the first semiconductor device. An active surface of the second semiconductor device may face away from the substrate. Electrical interconnections may extend from bond pads of the second semiconductor device, along surfaces of the second semiconductor device, first semiconductor device, and substrate to pads of routing members of the substrate. The electrical interconnections may include conductors in contact with the bond pads and the routing members and a dielectric material interposed between the conductors and the first semiconductor device, the second semiconductor device and the substrate between the bond pads and the pad of the routing members. An encapsulant distinct from the dielectric material may cover the electrical interconnections, the first semiconductor device, the second semiconductor device, and an upper surface of the substrate. Methods of fabrication are also disclosed.
Public/Granted literature
Information query
IPC分类: