Invention Application
- Patent Title: SUBSTRATE PROCESSING APPARATUS
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Application No.: US17082634Application Date: 2020-10-28
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Publication No.: US20210125854A1Publication Date: 2021-04-29
- Inventor: MIN SUNG HAN , WAN JAE PARK , YOON JONG JU , JAEHOO LEE
- Applicant: SEMES Co. Ltd.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES Co. Ltd.
- Current Assignee: SEMES Co. Ltd.
- Current Assignee Address: KR Cheonan-si
- Priority: KR10-2019-0134418 20191028
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/67 ; H01L21/683 ; H01J37/32 ; B25J11/00 ; B25J15/00 ; H05B3/00 ; H05B1/02

Abstract:
The present invention relates to a substrate processing apparatus capable of shortening a process time, and the substrate processing apparatus according to the present invention comprises an index chamber having a transfer robot loading/unloading a substrate; a process chamber having a heating means heating the substrate and processing the substrate; a loadlock chamber disposed between the index chamber and the process chamber; and a conveying chamber having a conveying robot conveying the substrate between the process chamber and the loadlock chamber, wherein a pre-heating means is provided in the conveying robot to pre-heat the substrate in a state before processing.
Public/Granted literature
- US11978654B2 Substrate processing apparatus Public/Granted day:2024-05-07
Information query
IPC分类: