- 专利标题: Direct Additive Synthesis from UV-Induced Solvated Electrons in Feedstock of Halogenated Material and Negative Electron Affinity Nanoparticle
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申请号: US17189702申请日: 2021-03-02
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公开(公告)号: US20210206020A1公开(公告)日: 2021-07-08
- 发明人: David Glen Findley
- 申请人: Lockheed Martin Corporation
- 申请人地址: US MD Bethesda
- 专利权人: Lockheed Martin Corporation
- 当前专利权人: Lockheed Martin Corporation
- 当前专利权人地址: US MD Bethesda
- 主分类号: B28B1/00
- IPC分类号: B28B1/00 ; B33Y10/00 ; B33Y30/00 ; B33Y70/00 ; C01B32/05 ; C01B32/26 ; C09D11/033 ; C09D11/037 ; C01B32/963
摘要:
In an embodiment, a system includes a three-dimensional (3D) printer, a feedstock, and a laser. The three-dimensional printer includes a platen including an inert metal, and an enclosure including an inert atmosphere. The feedstock is configured to be deposited onto the platen. The feedstock includes a halogenated solution and a nanoparticle having negative electron affinity. The laser is configured to induce the nanoparticle to emit solvated electrons into the halogenated solution to form, by reduction, a ceramic and a diatomic halogen.