- 专利标题： PELLICLE AND PELLICLE ASSEMBLY
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申请号： US17206649申请日： 2021-03-19
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公开(公告)号： US20210208500A1公开(公告)日： 2021-07-08
- 发明人: David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
- 申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- 申请人地址： NL Veldhoven; NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- 当前专利权人： ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- 当前专利权人地址： NL Veldhoven; NL Veldhoven
- 优先权： EP15200767.0 20151217
- 主分类号： G03F1/64
- IPC分类号： G03F1/64 ; G03F1/22 ; G03F7/20 ; G03F1/62
摘要：
A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
公开/授权文献
- US11347142B2 Pellicle and pellicle assembly 公开/授权日：2022-05-31
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