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公开(公告)号:US20180364561A1
公开(公告)日:2018-12-20
申请号:US16062017
申请日:2016-12-02
发明人: David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
摘要: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
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公开(公告)号:US20220252974A1
公开(公告)日:2022-08-11
申请号:US17728608
申请日:2022-04-25
发明人: David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willlem-Pieter VOORTHUIJZEN , James Norman WILEY
摘要: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号:US20210208500A1
公开(公告)日:2021-07-08
申请号:US17206649
申请日:2021-03-19
发明人: David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
摘要: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号:US20200064731A1
公开(公告)日:2020-02-27
申请号:US16667956
申请日:2019-10-30
发明人: David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnould Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN-ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
摘要: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号:US20180373141A1
公开(公告)日:2018-12-27
申请号:US16060837
申请日:2016-12-02
发明人: Derk Servatius Gertruda BROUNS , Paul JANSSEN , Mohammad Reza KAMALI , Maria PETER , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
摘要: A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
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公开(公告)号:US20190129299A1
公开(公告)日:2019-05-02
申请号:US16093537
申请日:2017-04-12
发明人: Maxim Aleksandrovich NASALEVICH , Erik Achilles ABEGG , Nirupam BANERJEE , Michiel Alexander BLAUW , Derk Servatius Gertruda BROUNS , Paul JANSSEN , Matthias KRUIZINGA , Egbert LENDERINK , Nicolae MAXIM , Andrey NIKIPELOV , Arnoud Willem NOTENBOOM , Claudia PILIEGO , Mária PÉTER , Gijsber RISPENS , Nadja SCHUH , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Antonius Willem VERBURG , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN , Aleksandar Nikolov ZDRAVICOV
摘要: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号:US20220008963A1
公开(公告)日:2022-01-13
申请号:US17294013
申请日:2019-11-22
发明人: Andrey NIKIPELOV , Dmitry KURILOVICH , Fabio SBRIZZAI , Marcus Adrianus VAN DE KERKHOF , Ties Wouter VAN DER WOORD , Willem Joan VAN DER ZANDE , Jeroen VAN DUIVENBODE , David Ferdinand VLES
摘要: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
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公开(公告)号:US20200209736A1
公开(公告)日:2020-07-02
申请号:US16614815
申请日:2018-06-08
发明人: David Ferdinand VLES , Chaitanya Krishna ANDE , Antonius Franciscus Johannes DE GROOT , Adrianus Johannes Maria GIESBERS , Johannes Joseph JANSSEN , Paul JANSSEN , Johan Flendrik KLOOTWIJK , Peter Simon Antonius KNAPEN , Evgenia KURGANOVA , Marcel Peter MEIJER , Wouter Rogier MEIJERINK , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Raymond OLSMAN , Hrishikesh PATEL , Maria PETER , Gerrit VAN DEN BOSCH , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , Hendrikus Jan WONDERGEM , Aleksandar Nikolov ZDRAVKOV
摘要: A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号:US20190056654A1
公开(公告)日:2019-02-21
申请号:US15770175
申请日:2016-10-11
发明人: Mária PÉTER , Erik Achilles ABEGG , Adrianus Johannes Maria GIESBERS , Johan Hendrik KLOOTWIJK , Maxim Aleksandrovich NASALEVICH , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
摘要: Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
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10.
公开(公告)号:US20190146332A1
公开(公告)日:2019-05-16
申请号:US16247179
申请日:2019-01-14
发明人: Pieter-Jan VAN ZWOL , Vadim Yevgenyevich BANINE , Jozef Petrus Henricus BENSCHOP , Florian Didier Albin DHALLUIN , Mária PÉTER , Luigi SCACCABAROZZI , Willem Joan VAN DER ZANDE
摘要: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.
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