A semiconductor device includes a semiconductor surface having circuitry with metal interconnect layers over the semiconductor surface including a selected metal interconnect layer providing an interconnect trace having a first and second end. A top dielectric layer is on the top metal interconnect layer. A redistribution layer (RDL) is on the top dielectric layer. A corrosion interruption structure (CIS) including the interconnect trace bridges an interrupting gap in a trace of the RDL.