- 专利标题: Method of Manufacturing Touch Structure and Touch Structure
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申请号: US16098030申请日: 2018-04-08
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公开(公告)号: US20210223915A1公开(公告)日: 2021-07-22
- 发明人: Jing Wang , Zouming Xu , Xiaodong Xie , Lei Zhang , Xianlin Ding , Qitao Zheng , Tsung Chieh Kuo , Dong Li , Qicheng Chen , Ting Zeng , Ming Zhang , Seong Cho Lee , Lingyan Wu , Guiyu Zhang
- 申请人: BOE Technology Group Co., Ltd. , Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- 申请人地址: CN Beijing; CN Hefei, Anhui
- 专利权人: BOE Technology Group Co., Ltd.,Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- 当前专利权人: BOE Technology Group Co., Ltd.,Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- 当前专利权人地址: CN Beijing; CN Hefei, Anhui
- 优先权: CN201710725537.8 20170822
- 国际申请: PCT/CN2018/082197 WO 20180408
- 主分类号: G06F3/044
- IPC分类号: G06F3/044
摘要:
A touch structure and a method of manufacturing the touch structure are provided. The method includes: forming a first conductive layer on a base substrate; forming a second conductive layer on the first conductive layer; and patterning the first conductive layer and the second conductive layer to respectively form a first conductive layer pattern and a second conductive layer pattern; the first conductive layer pattern is formed after the second conductive layer pattern is formed, and the first conductive layer pattern and the second conductive layer pattern are different from each other.
公开/授权文献
- US11184985B2 Method of manufacturing touch structure and touch structure 公开/授权日:2021-11-23
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