- 专利标题： CAPACITIVE SENSOR FOR CHAMBER CONDITION MONITORING
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申请号： US16812066申请日： 2020-03-06
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公开(公告)号： US20210280443A1公开(公告)日： 2021-09-09
- 发明人: Yaoling Pan , Patrick John Tae , Leonard Tedeschi , Jennifer Sun , Philip Allan Kraus , Xiaopu Li , Kallol Bera , Michael D. Willwerth , Albert Barrett Hicks, III , Lisa J. Enman , Mark Joseph Saly , Daniel Thomas McCormick
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H01L21/67
- IPC分类号： H01L21/67 ; G01N27/22 ; G05B19/418
摘要：
Embodiments disclosed herein comprise a sensor. In an embodiment, the sensor comprises a substrate having a first surface and a second surface opposite from the first surface. In an embodiment, the sensor further comprises a first electrode over the first surface of the substrate, and a second electrode over the first surface of the substrate and adjacent to the first electrode. In an embodiment, the sensor further comprises a barrier layer over the first electrode and the second electrode.
公开/授权文献
- US11581206B2 Capacitive sensor for chamber condition monitoring 公开/授权日：2023-02-14
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