- 专利标题： PHOTOSENSITIVE COMPOSITIONS, PREPARATION METHODS THEREOF, AND QUANTUM DOT POLYMER COMPOSITE PREPARED THEREFROM
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申请号： US17207501申请日： 2021-03-19
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公开(公告)号： US20210286259A1公开(公告)日： 2021-09-16
- 发明人: Shang Hyeun PARK , Hojeong PAEK , Eun Joo JANG , Shin Ae JUN
- 申请人： SAMSUNG ELECTRONICS CO., LTD. , SAMSUNG SDI CO., LTD.
- 申请人地址： KR Suwon-si; KR Yongin-si
- 专利权人： SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO., LTD.
- 当前专利权人： SAMSUNG ELECTRONICS CO., LTD.,SAMSUNG SDI CO., LTD.
- 当前专利权人地址： KR Suwon-si; KR Yongin-si
- 优先权： KR10-2015-0118208 20150821
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/033 ; G03F7/004 ; C09D4/06 ; C08F220/14 ; C09K11/02 ; C09K11/70 ; G02B5/20 ; G02B5/22
摘要：
A photosensitive composition including a quantum dot dispersion, a reactive compound having at least two thiol groups, a photopolymerizable monomer having a carbon-carbon double bond, and a photoinitiator, wherein the quantum dot dispersion includes a carboxylic acid group-containing polymer and a quantum dot dispersed in the carboxylic acid group containing polymer, and wherein the carboxylic acid group-containing polymer includes a copolymer of a monomer combination including a first monomer having a carboxylic acid group and a carbon-carbon double bond and a second monomer having a carbon-carbon double bond and a hydrophobic moiety and not having a carboxylic acid group.