- 专利标题： TRIVALENT CHROMIUM PLATING SOLUTION AND CHROMIUM PLATING METHOD USING SAME
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申请号： US17257348申请日： 2019-07-02
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公开(公告)号： US20210317589A1公开(公告)日： 2021-10-14
- 发明人: Madoka NAKAGAMI , Masao HORI , Yuto MORIKAWA
- 申请人： JCU CORPORATION
- 申请人地址： JP Taito-ku
- 专利权人： JCU CORPORATION
- 当前专利权人： JCU CORPORATION
- 当前专利权人地址： JP Taito-ku
- 优先权： JP2018-126508 20180703
- 国际申请： PCT/JP2019/026246 WO 20190702
- 主分类号： C25D3/10
- IPC分类号： C25D3/10 ; C25D3/06
摘要：
A trivalent chromium plating solution containing a trivalent chromium compound, a complexing agent, a conductive salt, and a pH-buffering agent, and further containing an organic compound having 2-4 carbon atoms and three or more chloro groups, and a trivalent chromium plating method using the same provide a practical trivalent chromium plating with enhanced corrosion resistance as compared to the ordinary trivalent chromium plating.
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