- 专利标题: FLOW GUIDE APPARATUS AND VAPOR DEPOSITION DEVICE
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申请号: US17237118申请日: 2021-04-22
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公开(公告)号: US20210332480A1公开(公告)日: 2021-10-28
- 发明人: Qiang ZHANG , Beumku PARK , Yuanjiang YANG , Tianming LI , Qingke HE , Jie LI , Ya ZHU , Yu WANG , Fujun YUAN , Binglei CAO , Xinxin HUANG
- 申请人: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- 申请人地址: CN Chengdu; CN Beijing
- 专利权人: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人地址: CN Chengdu; CN Beijing
- 优先权: CN202020631414.5 20200423
- 主分类号: C23C16/455
- IPC分类号: C23C16/455
摘要:
A flow guide apparatus includes a columnar flow guide portion, a plurality of connection portions and a loop portion. The columnar flow guide portion includes a first surface and a second surface that are perpendicular to a thickness direction thereof, and a blind hole formed in the second surface. A center line of the columnar flow guide portion is parallel to the thickness direction thereof. The plurality of connection portions are arranged at intervals and are at least connected with an edge of the second surface of the columnar flow guide portion. The loop portion is connected with the plurality of connection portions, and is farther away from the columnar flow guide portion than the plurality of connection portions.
公开/授权文献
- US11713509B2 Flow guide apparatus and vapor deposition device 公开/授权日:2023-08-01
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