CHEMICALLY STRENGTHENED GLASS SUBSTRATE WITH REDUCED INVADING ION SURFACE CONCENTRATION AND METHOD FOR MAKING THE SAME
摘要:
A method of implanting ions to modify the invading ion surface layer concentration of a chemically strengthened glass substrate, where the ions are selected from the group consisting of N, H, O, He, Ne, Ar, and Kr and are implanted in the chemically strengthened glass substrate with a dosage between 1014 ions/cm2 and 1018 ions/cm2, and an acceleration voltage between 5 kV and 100 kV.
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