SILICA PARTICLE DISPERSION LIQUID

    公开(公告)号:US20250059355A1

    公开(公告)日:2025-02-20

    申请号:US18938403

    申请日:2024-11-06

    Inventor: Hiromichi KAMO

    Abstract: The present invention relates to a silica particle dispersion including spherical silica particles and a solvent, in which the spherical silica particles have a median diameter d50 of 0.5 μm to 20 μm, and a product A×d50 of 2.7 μm·m2/g to 5.0 μm·m2/g, the product A×d50 being a product of a specific surface area A (m2/g) of the spherical silica particles and the median diameter d50 (μm).

    SILICA PARTICLE DISPERSION LIQUID

    公开(公告)号:US20250059053A1

    公开(公告)日:2025-02-20

    申请号:US18938417

    申请日:2024-11-06

    Inventor: Hiromichi KAMO

    Abstract: The present invention relates to a silica particle dispersion including: hollow silica particles; and a solvent, in which the hollow silica particles have an average particle diameter in a range of 0.2 μm to 10 μm. The present invention relates to the silica particle dispersion in which the hollow silica particles have a particle density of 0.35 g/cm3 to 2.00 g/cm3, the particle density being determined by density measurement with a dry pycnometer using argon gas.

    Reflective mask blank, reflective mask, and manufacturing method

    公开(公告)号:US12228853B2

    公开(公告)日:2025-02-18

    申请号:US18820061

    申请日:2024-08-29

    Applicant: AGC Inc.

    Inventor: Takeshi Okato

    Abstract: A reflective mask blank, which is a binary reflective mask blank, includes, in order: a substrate; a multilayer reflective film configured to reflect EUV light; and a pattern film. The pattern film has a laminated structure including a total of L layers each having a different refractive index where L is a natural number of 2 or more. When an absorption coefficient of an i-th layer in the pattern film from a side opposite to the substrate is defined as ki, a thickness of the i-th layer in the pattern film from the side opposite to the substrate is defined as di (nm), a total thickness of the pattern film is defined as d, an exposure wavelength is defined as λ (nm), and Pi is defined as 1−exp(−2π/λ*diki), the following formula (1) is satisfied. ∑ i = 1 L ( P i / d ) > 0.012 ( 1 )

    ELECTROMAGNETIC WAVE REFLECTING DEVICE, ELECTROMAGNETIC WAVE REFLECTING FENCE, AND REFLECTION PANEL

    公开(公告)号:US20250055201A1

    公开(公告)日:2025-02-13

    申请号:US18923582

    申请日:2024-10-22

    Applicant: AGC Inc.

    Inventor: Kumiko KAMBARA

    Abstract: An electromagnetic wave reflecting device includes a reflection panel configured to reflect radio waves in a desired band selected from a band of frequencies equal to or higher than 1 GHz and equal to or lower than 170 GHz, and a frame that holds the reflection panel. The reflection panel includes: a dielectric layer; a periodic conductive pattern provided on one surface of the dielectric layer; a ground layer provided on the other surface of the dielectric layer; a first intermediate layer covering the conductive pattern; a first dielectric substrate bonded to the conductive pattern by the first intermediate layer; a second intermediate layer covering the ground layer; and a second dielectric substrate bonded to the ground layer by the second intermediate layer.

    GLASS PLATE PRODUCTION METHOD
    8.
    发明申请

    公开(公告)号:US20250051213A1

    公开(公告)日:2025-02-13

    申请号:US18931185

    申请日:2024-10-30

    Applicant: AGC Inc.

    Inventor: Satoshi OGAMI

    Abstract: A glass plate (a glass plate for cover glasses) with a low concentration of impurities is produced using article cullet. A process of melting glass raw materials and cullet and producing therefrom a glass plate is repeated. The glass plate is further processed into a glass article. The glass article is a cover glass for displays, including the glass plate and a coating provided on a surface of the glass plate. The cullet used includes glass plate cullet that is cullet of the glass plate and article cullet that is cullet of the article cullet. At least one of the mixing ratio of the glass raw material, the mixing ratio of the glass plate cullet, the mixing ratio of the article cullet, the impurity concentration in the glass plate cullet and the impurity concentration in the article cullet is adjusted in accordance with at least one of the impurity concentration in the glass plate cullet and the impurity concentration in the article cullet.

    PHOTOSENSITIVE GLASS AND PRODUCTION METHOD THEREFOR

    公开(公告)号:US20250042802A1

    公开(公告)日:2025-02-06

    申请号:US18790697

    申请日:2024-07-31

    Applicant: AGC Inc.

    Abstract: The present invention relates to a photosensitive glass, having a β-OH value of 0.20/mm or less. The present invention also relates to the photosensitive glass, having a difference between a crystal precipitation temperature after an exposure and a crystal precipitation temperature before the exposure of 10° C. or more, the exposure being performed so that a cumulative amount of a light having a wavelength of 280 nm to 360 nm is 2 J/cm2 or more.

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