- 专利标题： CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR
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申请号： US17109878申请日： 2020-12-02
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公开(公告)号： US20210373436A1公开(公告)日： 2021-12-02
- 发明人: Hsin-Chang LEE , Pei-Cheng HSU , Hao-Ping CHENG , Ta-Cheng LIEN
- 申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 申请人地址： TW Hsinchu
- 专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- 当前专利权人地址： TW Hsinchu
- 主分类号： G03F1/82
- IPC分类号： G03F1/82 ; G03F1/64
摘要：
In a method of cleaning a photo mask, the photo mask is placed on a support such that a pattered surface faces down, and an adhesive sheet is applied to edges of a backside surface of the photo mask.
公开/授权文献
- US11385538B2 Cleaning method for photo masks and apparatus therefor 公开/授权日：2022-07-12
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