Invention Application
- Patent Title: High Speed Synchronization Of Plasma Source/Bias Power Delivery
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Application No.: US17480993Application Date: 2021-09-21
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Publication No.: US20220005674A1Publication Date: 2022-01-06
- Inventor: Aaron T. RADOMSKI , Benjamin J. GITLIN , Larry J. FISK, II , Mariusz OLDZIEJ , Aaron M. BURRY , Jonathan W. SMYKA , Alexei MARAKHTANOV , Bing JI , Felix Leib KOZAKEVICH , John HOLLAND , Ranadeep BHOWMICK
- Applicant: MKS Instruments, Inc. , LAM RESEARCH CORPORATION
- Applicant Address: US MA Andover; US CA Fremont
- Assignee: MKS Instruments, Inc.,LAM RESEARCH CORPORATION
- Current Assignee: MKS Instruments, Inc.,LAM RESEARCH CORPORATION
- Current Assignee Address: US MA Andover; US CA Fremont
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.
Public/Granted literature
- US11935726B2 High speed synchronization of plasma source/bias power delivery Public/Granted day:2024-03-19
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