- 专利标题： Electrode Slurry Coating Apparatus and Method for Forming Double Active Material Layers
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申请号： US17278919申请日： 2020-09-16
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公开(公告)号： US20220006064A1公开(公告)日： 2022-01-06
- 发明人: Taek Soo Lee , Young Joon Jo , Sang Hoon Choy , Ki Tae Kim , Ji Hee Yoon , Cheol Woo Kim
- 申请人： LG Chem, Ltd.
- 申请人地址： KR Seoul
- 专利权人： LG Chem, Ltd.
- 当前专利权人： LG Chem, Ltd.
- 当前专利权人地址： KR Seoul
- 优先权： KR10-2019-0128891 20191017
- 国际申请： PCT/KR2020/012451 WO 20200916
- 主分类号： H01M4/04
- IPC分类号： H01M4/04 ; B05C5/02 ; B05C11/10 ; H01M10/0525
摘要：
The present invention relates to electrode slurry coating apparatus and method, the present invention ultimately allowing the process efficiency to be increased and rate of errors to be reduced when double-layer structured active material layers are formed by temporally adjusting the height of first and second discharge outlets through which active material is discharged.
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