- 专利标题: ELECTROCONDUCTIVE SUBSTRATE HAVING METAL WIRING, METHOD FOR PRODUCING THE ELECTROCONDUCTIVE SUBSTRATE, AND METAL INK FOR FORMING METAL WIRING
-
申请号: US17294260申请日: 2019-11-13
-
公开(公告)号: US20220015232A1公开(公告)日: 2022-01-13
- 发明人: Kenjiro KOSHIJI , Yuichi MAKITA , Noriaki NAKAMURA , Masato KASUGA , Yuusuke OHSHIMA , Hiroki SATO , Hitoshi KUBO
- 申请人: TANAKA KIKINZOKU KOGYO K.K.
- 申请人地址: JP Tokyo
- 专利权人: TANAKA KIKINZOKU KOGYO K.K.
- 当前专利权人: TANAKA KIKINZOKU KOGYO K.K.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2018-215738 20181116
- 国际申请: PCT/JP2019/044507 WO 20191113
- 主分类号: H05K1/09
- IPC分类号: H05K1/09 ; C09D11/037 ; H05K3/12 ; H01B1/02
摘要:
An electroconductive substrate including a base material and a metal wiring made of at least either of silver and copper, and the electroconductive substrate has an antireflection region formed on part or all of the metal wiring surface. This antireflection region is composed of roughened particles made of at least either of silver and copper and blackened particles finer than the roughened particles and embedded between the roughened particles. The blackened particles are made of silver or a silver compound, copper or a copper compound, or carbon or an organic substance having a carbon content of 25 wt % or more. The antireflection region has a surface with a center line average roughness of 15 nm or more and 70 nm or less. The electroconductive substrate is formed from metal wiring from a metal ink that forms roughened particles, followed by application of a blackening ink containing blackened particles.
公开/授权文献
信息查询