Invention Application
- Patent Title: LASER PROCESSING METHOD, SEMICONDUCTOR MEMBER MANUFACTURING METHOD, AND LASER PROCESSING DEVICE
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Application No.: US17414668Application Date: 2019-12-18
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Publication No.: US20220055156A1Publication Date: 2022-02-24
- Inventor: Atsushi TANAKA , Chiaki SASAOKA , Hiroshi AMANO , Daisuke KAWAGUCHI , Yotaro WANI , Yasunori IGASAKI , Toshiki YUI
- Applicant: National University Corporation Tokai National Higher Education and Research System , HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Nagoya-shi, Aichi; JP Hamamatsu-shi, Shizuoka
- Assignee: National University Corporation Tokai National Higher Education and Research System,HAMAMATSU PHOTONICS K.K.
- Current Assignee: National University Corporation Tokai National Higher Education and Research System,HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Nagoya-shi, Aichi; JP Hamamatsu-shi, Shizuoka
- Priority: JP2018-239883 20181221
- International Application: PCT/JP2019/049701 WO 20191218
- Main IPC: B23K26/53
- IPC: B23K26/53 ; B28D5/00

Abstract:
There is provided a laser processing method for cutting a semiconductor object along a virtual plane facing a surface of the semiconductor object in the semiconductor object. The laser processing method includes a first step of forming a plurality of first modified spots along the virtual plane to obtain first formation density, by causing laser light to enter into the semiconductor object from the surface, and a second step of forming a plurality of second modified spots along the virtual plane so as to obtain second formation density higher than the first formation density, by causing laser light to enter into the semiconductor object from the surface after the first step.
Information query
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