- 专利标题: POST-PROCESSING DEVICE AND LIQUID DISCHARGE DEVICE
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申请号: US17449194申请日: 2021-09-28
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公开(公告)号: US20220098000A1公开(公告)日: 2022-03-31
- 发明人: Masayoshi MIYAKAWA , Hirohisa ADACHI
- 申请人: SEIKO EPSON CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: SEIKO EPSON CORPORATION
- 当前专利权人: SEIKO EPSON CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2020-162974 20200929
- 主分类号: B65H43/04
- IPC分类号: B65H43/04 ; B41J11/66 ; B65H35/00 ; B65H35/06
摘要:
Provided are a placement table configured to place a medium onto which liquid is discharged, a perforation member configured to perform perforation by imparting a shear force to the medium placed at the placement table, a die hole provided at the placement table, a perforation member moving section configured to move the perforation member between a standby position above the die hole and a perforating position at which the perforation member enters the die hole, and a control unit configured to control operation of the perforation member moving section, wherein when the control unit obtains perforation failure information during perforating operation in which the perforation member starts moving from the standby position and moves through the perforating position to the standby position, the control unit is configured to control the perforation member moving section so that a shear force is again imparted to the medium.
公开/授权文献
- US11685628B2 Post-processing device and liquid discharge device 公开/授权日:2023-06-27
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