Invention Application
- Patent Title: METHOD OF MANUFACTURING POLYCRYSTALLINE SILICON LAYER, DISPLAY DEVICE, AND METHOD OF MANUFACTURING DISPLAY DEVICE
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Application No.: US17503358Application Date: 2021-10-18
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Publication No.: US20220102447A1Publication Date: 2022-03-31
- Inventor: Dong-Sung LEE , Seo Jong OH , Byung Soo SO , Dong-min LEE
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Priority: KR10-2018-0142225 20181119
- Main IPC: H01L27/32
- IPC: H01L27/32 ; H01L21/02 ; H01L29/66 ; H01L29/786
Abstract:
A method of manufacturing a polycrystalline silicon layer for a display device includes the steps of forming an amorphous silicon layer on a substrate, cleaning the amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.
Public/Granted literature
- US12058888B2 Display device having polycrystalline silicon layer Public/Granted day:2024-08-06
Information query
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