Invention Application
- Patent Title: Edge-Emitting Semiconductor Laser Diode and Method of Manufacturing the Same
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Application No.: US17596642Application Date: 2020-07-09
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Publication No.: US20220102941A1Publication Date: 2022-03-31
- Inventor: Martin Hetzl , Petrus Sundgren , Jens Ebbecke , Uwe Strauß
- Applicant: OSRAM Opto Semiconductors GmbH
- Applicant Address: DE Regensburg
- Assignee: OSRAM Opto Semiconductors GmbH
- Current Assignee: OSRAM Opto Semiconductors GmbH
- Current Assignee Address: DE Regensburg
- Priority: DE102019118993.4 20190712
- International Application: PCT/EP2020/069411 WO 20200709
- Main IPC: H01S5/20
- IPC: H01S5/20 ; H01S5/028 ; H01S5/02 ; H01S5/10 ; H01S5/343

Abstract:
In an embodiment, an edge-emitting semiconductor laser diode includes a growth substrate, a semiconductor layer sequence located on the growth substrate, the semiconductor layer sequence having an active layer and an etch stop layer and two facets located opposite each other, wherein the facets bound the semiconductor layer sequence in a lateral direction, wherein the semiconductor layer sequence includes two edge regions adjoining the facets and a central region directly adjoining both edge regions, wherein, within each of the edge regions, a volume fraction of the active layer in the semiconductor layer sequence is smaller than in the central region, wherein the active layer is spaced apart from one facet, wherein a distance of the active layer to the facet varies along a direction parallel to this facet, and wherein the etch stop layer is arranged between the growth substrate and the active layer.
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