- 专利标题: APPARATUS OF CHARGED-PARTICLE BEAM SUCH AS ELECTRON MICROSCOPE COMPRISING PLASMA GENERATOR, AND METHOD THEREOF
-
申请号: US17644789申请日: 2021-12-17
-
公开(公告)号: US20220115204A1公开(公告)日: 2022-04-14
- 发明人: Zhongwei Chen , Xiaoming Chen , Daniel Tang , Liang-Fu Fan
- 申请人: Zhongwei Chen , Xiaoming Chen , Daniel Tang , Liang-Fu Fan
- 申请人地址: US CA Los Altos Hills; US CA Sunnyvale; US CA Fremont; US CA Fremont
- 专利权人: Zhongwei Chen,Xiaoming Chen,Daniel Tang,Liang-Fu Fan
- 当前专利权人: Zhongwei Chen,Xiaoming Chen,Daniel Tang,Liang-Fu Fan
- 当前专利权人地址: US CA Los Altos Hills; US CA Sunnyvale; US CA Fremont; US CA Fremont
- 主分类号: H01J37/26
- IPC分类号: H01J37/26 ; H01J37/244 ; B08B7/00
摘要:
The present invention provides an apparatus of charged-particle beam e.g. an electron microscope comprising an in-column plasma generator for selectively cleaning BSE detector and BF/DF detector. In various embodiments, the plasma generator is located between a lower pole piece of objective lens and the BF/DF detectors, but outside trajectory area of the charged-particles from the sample stage to the BF/DF detector. Cleaning decomposed biological samples or contaminants on the surface of the detectors frequently and selectively with in-situ generated plasma can prevent the detectors from performance deterioration such as losing resolution and contrast in imaging at high levels of magnification.
公开/授权文献
信息查询