Invention Application
- Patent Title: LASER IRRADIATION METHOD AND LASER IRRADIATION APPARATUS
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Application No.: US17559415Application Date: 2021-12-22
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Publication No.: US20220115233A1Publication Date: 2022-04-14
- Inventor: Hiroshi OKUMURA , Jongjun BAEK , Dong-Sung LEE
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Priority: KR10-2018-0155539 20181205
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67

Abstract:
A laser irradiation method includes a first scanning wherein a laser beam is scanned in a first region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using a spot laser beam, and a second scanning wherein laser beam is scanned in a second region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using the spot laser beam. A center of the second region is spaced apart from a center of the first region in the X direction.
Public/Granted literature
- US11854804B2 Laser irradiation method and laser irradiation apparatus Public/Granted day:2023-12-26
Information query
IPC分类: