Invention Application
- Patent Title: NORMALIZING FLUID IN A FLUIDIC DEVICE
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Application No.: US17414031Application Date: 2019-07-31
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Publication No.: US20220146544A1Publication Date: 2022-05-12
- Inventor: Diane R. Hammerstad , Jeffrey A. Nielsen , Christie Dudenhoefer , Matthew Smith
- Applicant: Hewlett-Packard Development Company, L.P.
- Applicant Address: US TX Spring
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Spring
- International Application: PCT/US2019/044335 WO 20190731
- Main IPC: G01N35/10
- IPC: G01N35/10 ; B01L3/02

Abstract:
Aspects of the present disclosure relate to evaporation compensation in fluidic devices. An example apparatus for evaporation compensation includes an assessment circuit to determine an amount of evaporation of a volume dispensed in a microwell of a fluidic device. The amount of evaporation may be determined based on the volume in the microwell, and an amount of time after dispensing the volume in the microwell. A compensation circuit may determine, based on the amount of evaporation, a compensation factor for the microwell including an amount of a normalizing fluid to compensate for the amount of evaporation. The compensation circuit may also create a normalization profile for the fluidic device, including an association between the fluidic device and the compensation factor. A dispensing circuit may dispense the normalizing fluid in the microwell according to the normalization profile.
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