Invention Application
- Patent Title: ELECTROSTATIC CLAMP FOR A LITHOGRAPHIC APPARATUS
-
Application No.: US17438021Application Date: 2020-03-06
-
Publication No.: US20220146948A1Publication Date: 2022-05-12
- Inventor: Hari KRISHNAN , Joseph Harry LYONS , Eric Justin MONKMAN , Victor Antonio PEREZ-FALCON
- Applicant: ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2020/055957 WO 20200306
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/683

Abstract:
An electrostatic clamp for supporting a substrate includes a substrate region, an electrode region at an edge of the substrate region, a support layer, an electrically conductive layer, a contact layer, and an electrode. The support layer has a body having first and second surfaces that are substantially parallel to each other and disposed on opposite sides of the body. A through-hole is disposed in the electrode region and provides access between the first and second surfaces. The electrically conductive layer is disposed on the second surface of the support layer. The contact layer disposed on the electrically conductive layer. The contact layer is uninterrupted in the electrode region and comprises burls in the substrate region. The burls contact the substrate when the electrostatic clamp is supporting the substrate. The electrode is disposed in the through-hole and is electrically coupled to the electrically conductive layer.
Information query
IPC分类: