Invention Application
- Patent Title: NANOPARTICLE, NANOPARTICLE LAYER PATTERNING METHOD AND RELATED APPLICATION
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Application No.: US17351376Application Date: 2021-06-18
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Publication No.: US20220169922A1Publication Date: 2022-06-02
- Inventor: Zhuo CHEN , Tieshi Wang
- Applicant: Beijing BOE Technology Development Co., Ltd. , BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing; CN Beijing
- Assignee: Beijing BOE Technology Development Co., Ltd.,BOE Technology Group Co., Ltd.
- Current Assignee: Beijing BOE Technology Development Co., Ltd.,BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing; CN Beijing
- Priority: CN202011376226.3 20201130
- Main IPC: C09K11/06
- IPC: C09K11/06 ; G03F7/004 ; H01L51/50 ; H01L51/56

Abstract:
The present disclosure discloses a nanoparticle, a nanoparticle layer patterning method and related application. When the nanoparticle disclosed by the present disclosure is adopted to form a patterned nanoparticle layer on a substrate, a photosensitive material is added in the nanoparticle, then a protective group in a first ligand is dissociated to form an amino under the irradiation of light with a preset wavelength, a second ligand including an amino is formed on a surface of a nanometer particle, and a polarity of the second ligand is different from a polarity of the first ligand; and the amino of the second ligand is cross-linked with an adjacent nanoparticle.
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