- 专利标题: METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC SYSTEM
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申请号: US17436947申请日: 2020-02-26
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公开(公告)号: US20220171290A1公开(公告)日: 2022-06-02
- 发明人: Alexandru ONOSE , Remco DIRKS , Roger Hubertus Elisabeth Clementin BOSCH , Sander Silvester Adelgondus Marie JACOBS , Frank Jaco BUIJNSTERS , Siebe Tjerk DE ZWART , Artur PALHA DA SILVA CLERIGO , Nick VERHEUL
- 申请人: ASML NETHERLANDS B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 优先权: EP19162808.0 20190314,EP19178432.1 20190605
- 国际申请: PCT/EP2020/054967 WO 20200226
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A method, computer program and associated apparatuses for metrology. The method includes determining a reconstruction recipe describing at least nominal values for use in a reconstruction of a parameterization describing a target. The method includes obtaining first measurement data relating to measurements of a plurality of targets on at least one substrate, the measurement data relating to one or more acquisition settings and performing an optimization by minimizing a cost function which minimizes differences between the first measurement data and simulated measurement data based on a reconstructed parameterization for each of the plurality of targets. A constraint on the cost function is imposed based on a hierarchical prior. Also disclosed is a hybrid model method comprising obtaining a coarse model operable to provide simulated coarse data; and training a data driven model to correct the simulated coarse data so as to determine simulated data for use in reconstruction.
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