Invention Application
- Patent Title: HYDROGEN GAS SUPPLY APPARATUS AND HYDROGEN GAS SUPPLY METHOD
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Application No.: US17441924Application Date: 2020-03-24
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Publication No.: US20220193600A1Publication Date: 2022-06-23
- Inventor: Kazumi MAEHARA , Daisaku TATEISHI , Motoyoshi FUKUOKA , Tadashi SEIKE
- Applicant: ENEOS Corporation
- Applicant Address: JP Tokyo
- Assignee: ENEOS Corporation
- Current Assignee: ENEOS Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2019-064192 20190328
- International Application: PCT/JP2020/013044 WO 20200324
- Main IPC: B01D53/053
- IPC: B01D53/053 ; B01D53/04 ; F17C7/00 ; F17C13/04 ; C01B3/56

Abstract:
A hydrogen gas supply apparatus according to one aspect of the present invention includes a compressor configured to compress hydrogen gas and supply the hydrogen gas compressed to a pressure accumulator which accumulates the hydrogen gas, an adsorption column disposed between the discharge port of the compressor and the pressure accumulator, and configured to include an adsorbent for adsorbing impurities in the hydrogen gas discharged from the compressor, and a plurality of valves disposed at the gas inlet/outlet port side of the adsorption column, being at a discharge port side of the compressor, and configured to be able to seal the adsorption column, wherein the space in the adsorption column is sealed using the plurality of valves such that the inside of the adsorption column is maintained to have a high pressure by the hydrogen gas compressed in the case where the compressor is stopped.
Information query
IPC分类: