公开(公告)号：US20220193600A1

公开(公告)日：2022-06-23

申请号：US17441924

申请日：2020-03-24

Applicant: ENEOS Corporation

Inventor： Kazumi MAEHARA ,  Daisaku TATEISHI ,  Motoyoshi FUKUOKA ,  Tadashi SEIKE

IPC: B01D53/053 ,  B01D53/04 ,  F17C7/00 ,  F17C13/04 ,  C01B3/56

Abstract: A hydrogen gas supply apparatus according to one aspect of the present invention includes a compressor configured to compress hydrogen gas and supply the hydrogen gas compressed to a pressure accumulator which accumulates the hydrogen gas, an adsorption column disposed between the discharge port of the compressor and the pressure accumulator, and configured to include an adsorbent for adsorbing impurities in the hydrogen gas discharged from the compressor, and a plurality of valves disposed at the gas inlet/outlet port side of the adsorption column, being at a discharge port side of the compressor, and configured to be able to seal the adsorption column, wherein the space in the adsorption column is sealed using the plurality of valves such that the inside of the adsorption column is maintained to have a high pressure by the hydrogen gas compressed in the case where the compressor is stopped.

公开(公告)号：US20250153087A1

公开(公告)日：2025-05-15

申请号：US19027672

申请日：2025-01-17

Applicant: ENEOS CORPORATION

Inventor： Kazumi MAEHARA ,  Daisaku TATEISHI ,  Motoyoshi FUKUOKA ,  Tadashi SEIKE

IPC: B01D53/04 ,  B01J20/28 ,  B01J20/34 ,  C01B3/56 ,  F17C5/06

Abstract: A control apparatus for controlling a gas purification apparatus includes a circuit configured to control to depressurize a pressure inside a compressor configured to compress a gas. The gas purification apparatus includes the compressor, a first adsorption part configured to include a first adsorbent which adsorbs impurities mixed in the gas, a second adsorption part configured to include a second adsorbent which adsorbs the impurities, and a valve provided on a pipe connecting the compressor, the first adsorption part, and the second adsorption part. The circuit is further configured to control the valve so that the second adsorbent adsorbs the impurities desorbed from the first adsorbent in a case that a pressure inside the compressor is depressurized, to regenerate the first adsorption part.

公开(公告)号：US20220161183A1

公开(公告)日：2022-05-26

申请号：US17441499

申请日：2020-03-24

Applicant: ENEOS CORPORATION

Inventor： Kazumi MAEHARA ,  Daisaku TATEISHI ,  Motoyoshi FUKUOKA ,  Tadashi SEIKE

IPC: B01D53/04 ,  F17C5/06 ,  C01B3/56 ,  B01J20/28 ,  B01J20/34

Abstract: A hydrogen gas supply apparatus includes a compressor configured to compress hydrogen gas and supply the compressed hydrogen gas toward a pressure accumulator which accumulates the hydrogen gas, a first adsorption column disposed between the discharge port of the compressor and the pressure accumulator and configured to include the first adsorbent for adsorbing impurities in the hydrogen gas discharged from the compressor, a first valve disposed between the discharge port of the compressor and the gas inlet port of the first adsorption column, a second valve disposed between the gas outlet port of the first adsorption column and the pressure accumulator, a return pipe configured to branch from between the first valve and the gas inlet port of the adsorption column and connect to the suction side of the compressor, and a second adsorption column disposed in the middle of the return pipe.