Invention Application
- Patent Title: Conductive Interconnects and Methods of Forming Conductive Interconnects
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Application No.: US17693119Application Date: 2022-03-11
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Publication No.: US20220199123A1Publication Date: 2022-06-23
- Inventor: Raju Ahmed , David A. Kewley , Dave Pratt , Yung-Ta Sung , Frank Speetjens , Gurpreet Lugani
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Main IPC: G11C5/06
- IPC: G11C5/06 ; H01L23/532

Abstract:
Some embodiments include an integrated assembly having an interconnect over a first conductive structure and coupled with the first conductive structure. The interconnect includes a conductive core. The conductive core has a slender upper region and a wide lower region. The upper region joins to the lower region at a step. A liner laterally surrounds the lower region of the conductive core. The liner has an upper surface which is substantially coplanar with the step. An insulative collar is over and directly against both an upper surface of the step and the upper surface of the liner. The insulative collar laterally surrounds and directly contacts the slender upper region. A second conductive structure is over and directly against a region of the insulative collar, and is over and directly against an upper surface of the slender upper region. Some embodiments include methods of forming integrated assemblies.
Public/Granted literature
- US11978527B2 Conductive interconnects and methods of forming conductive interconnects Public/Granted day:2024-05-07
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