Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND METHOD
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Application No.: US17698100Application Date: 2022-03-18
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Publication No.: US20220206400A1Publication Date: 2022-06-30
- Inventor: Nicolaas TEN KATE , Joost Jeroen OTTENS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Robbert Jan VOOGD , Giovanni Francisco NINO , Marinus Jan REMIE , Johannes Henricus Wilhelmus JACOBS , Thibault Simon Mathieu LAURENT , Johan Gertrudis Cornelis KUNNEN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
Public/Granted literature
- US11630399B2 Lithographic apparatus and method Public/Granted day:2023-04-18
Information query
IPC分类:
