公开(公告)号：US20230054421A1

公开(公告)日：2023-02-23

申请号：US17982226

申请日：2022-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna DE SIMONE ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Thibault Simon Mathieu LAURENT ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Niek Jacobus Johannes ROSET ,  Justin Johannes Hermanus GERRITZEN

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US20220206400A1

公开(公告)日：2022-06-30

申请号：US17698100

申请日：2022-03-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Marinus Jan REMIE ,  Johannes Henricus Wilhelmus JACOBS ,  Thibault Simon Mathieu LAURENT ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US20190163066A1

公开(公告)日：2019-05-30

申请号：US16097640

申请日：2017-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Martijn HOUBEN ,  Nicholas Peter WATERSON ,  Thibault Simon Mathieu LAURENT ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Vincentius Fransiscus CLOOSTERMAN ,  Siegfried Alexander TROMP ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Niek Jacobus Johannes ROSET

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US20170212421A1

公开(公告)日：2017-07-27

申请号：US15482526

申请日：2017-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hrishikesh PATEL ,  Johannes Henricus Wilhelmus JACOBS ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Thibault Simon Mathieu LAURENT ,  Marcio Alexandre Cano MIRANDA ,  Ruud Hendricus Martinus Johannes BLOKS ,  Peng FENG ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20 ,  H01L21/67 ,  G03F7/30 ,  H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

公开(公告)号：US20200285154A1

公开(公告)日：2020-09-10

申请号：US16879961

申请日：2020-05-21

Applicant: ASML NETHERLANDS B.V

Inventor： Gijs KRAMER ,  Martijn HOUBEN ,  Nicholas Peter WATERSON ,  Thibault Simon Mathieu LAURENT ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Vincentius Fransiscus CLOOSTERMAN ,  Siegfried Alexander TROMP ,  Coen Hubertus Matheus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Niek Jacobus Johannes ROSET

IPC: G03F7/20

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US20170363964A1

公开(公告)日：2017-12-21

申请号：US15694519

申请日：2017-09-01

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Haico Victor KOK ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Johannes Antonius Maria VAN DE WAL ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Robbert-Jan VOOGD ,  Jan Steven Christiaan WESTERLAKEN ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Allard Eelco KOOIKER ,  Wilhelmina Margareta Jozef HURKENS-MERTENS ,  Yohann Bruno Yvon TEILLET

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70858 ,  G03F7/70891

Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

公开(公告)号：US20200371447A1

公开(公告)日：2020-11-26

申请号：US16993896

申请日：2020-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20190171113A1

公开(公告)日：2019-06-06

申请号：US16270958

申请日：2019-02-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Takeshi KANEKO ,  Robbert Jan VOOGD ,  Gregory Martin Mason CORCORAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johan Gertrudis Cornelis KUNNEN ,  Ramin BADIE

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US20180267412A1

公开(公告)日：2018-09-20

申请号：US15918478

申请日：2018-03-12

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20180239265A1

公开(公告)日：2018-08-23

申请号：US15958714

申请日：2018-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.