Invention Application
- Patent Title: CYCLOHEPTATRIENE MOLYBDENUM (0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS
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Application No.: US17146890Application Date: 2021-01-12
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Publication No.: US20220220607A1Publication Date: 2022-07-14
- Inventor: Andrea Leoncini , Paul Mehlmann , Nemanja Dordevic , Han Vinh Huynh , Doreen Wei Ying Yong
- Applicant: Applied Materials, Inc. , National University of Singapore
- Applicant Address: US CA Santa Clara; SG Singapore
- Assignee: Applied Materials, Inc.,National University of Singapore
- Current Assignee: Applied Materials, Inc.,National University of Singapore
- Current Assignee Address: US CA Santa Clara; SG Singapore
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/40 ; C23C16/34 ; C23C16/32 ; C23C16/42

Abstract:
Molybdenum(0) coordination complexes comprising at least one cycloheptatriene ligand and optionally one or more neutral ligands which coordinate to the metal center by carbon, nitrogen or phosphorous are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous.
Public/Granted literature
- US11530477B2 Cycloheptatriene molybdenum (0) precursors for deposition of molybdenum films Public/Granted day:2022-12-20
Information query
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