Invention Application
- Patent Title: WAFER-CLEANING APPARATUS INCLUDING A WINDOW PROTECTOR AND A METHOD OF CLEANING A WAFER
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Application No.: US17398219Application Date: 2021-08-10
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Publication No.: US20220230872A1Publication Date: 2022-07-21
- Inventor: Hunjae JANG , Seungmin SHIN , Kuntack LEE , Seungho KIM , Younghoo KIM , Taehong KIM , Sunghyun PARK
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR SUWON-SI
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR SUWON-SI
- Priority: KR10-2021-0005789 20210115
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B08B3/10 ; B08B7/00 ; B08B3/08

Abstract:
A wafer-cleaning apparatus includes an inner pin that supports a wafer. The wafer-cleaning apparatus further includes a nozzle disposed above the inner pin, a light source disposed under the inner pin, a window disposed between the light source and the wafer, and a window protector disposed between the wafer and the window. The nozzle supplies a chemical liquid to the wafer and the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer. The window protector receives a portion of the chemical liquid that flows out of the wafer and the light source supplies the light to the wafer through the window protector and the window.
Public/Granted literature
Information query
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