Invention Application
- Patent Title: CORRECTING ABERRATION AND APODIZATION OF AN OPTICAL SYSTEM USING CORRECTION PLATES
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Application No.: US17574157Application Date: 2022-01-12
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Publication No.: US20220244530A1Publication Date: 2022-08-04
- Inventor: Haifeng Huang , Rui-Fang Shi , Joseph Walsh , Mitchell Lindsay , Eric Vella
- Applicant: KLA Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA Corporation
- Current Assignee: KLA Corporation
- Current Assignee Address: US CA Milpitas
- Main IPC: G02B27/00
- IPC: G02B27/00 ; G02B27/58

Abstract:
An optical system with aberration correction is disclosed. The optical system may include an illumination source. The optical system may include a detector. The optical system may include one or more collection optics configured to image a sample onto the detector based on illumination from the illumination source. The optical system may include two or more aberration correction plates located in one or more pupil planes of the one or more collection optics. The two or more aberration correction plates may provide at least partial correction of two or more linearly-independent aberration terms. Any particular one of the two or more aberration correction plates may have a spatially-varying thickness profile providing a selected amount of correction for a single particular aberration term of the two or more linearly-independent aberration terms.
Public/Granted literature
- US12092814B2 Correcting aberration and apodization of an optical system using correction plates Public/Granted day:2024-09-17
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