Invention Application
- Patent Title: SUBSTRATE PROCESSING DEVICE
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Application No.: US17670127Application Date: 2022-02-11
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Publication No.: US20220259740A1Publication Date: 2022-08-18
- Inventor: SungBae Kim
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Main IPC: C23C16/52
- IPC: C23C16/52 ; C23C16/455 ; C23C16/44
Abstract:
A substrate processing device capable of detecting a gas leakage includes at least one reactor; a gas supply unit configured to supply a gas to the reactor; and a detection unit connected to the gas supply unit, wherein the detection unit is configured to detect a gas flow in the gas supply unit.
Public/Granted literature
- US1687739A Roller skate Public/Granted day:1928-10-16
Information query
IPC分类:
