- 专利标题: NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION
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申请号: US17630556申请日: 2020-07-29
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公开(公告)号: US20220260912A1公开(公告)日: 2022-08-18
- 发明人: Daishi YOKOYAMA , Seishi SHIBAYAMA , Atsuko NOYA
- 申请人: Merck Patent GmbH
- 申请人地址: DE Darmstadt
- 专利权人: Merck Patent GmbH
- 当前专利权人: Merck Patent GmbH
- 当前专利权人地址: DE Darmstadt
- 优先权: JP2019-141190 20190731
- 国际申请: PCT/EP2020/071327 WO 20200729
- 主分类号: G03F7/075
- IPC分类号: G03F7/075 ; G03F7/033 ; G03F7/105 ; G03F7/20 ; G03F7/32
摘要:
[Problem] To provide a negative type photosensitive composition which can be developed with a low-concentration developer. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin having a carboxyl group, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent, wherein the content of the compound containing two or more (meth)acryloyloxy groups is 40 to 300 mass % based on the total mass of the alkali-soluble resin.
公开/授权文献
- US11579530B2 Negative type photosensitive composition 公开/授权日:2023-02-14
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