Invention Application
- Patent Title: PHOTO-CROSSLINKABLE PRESSURE-SENSITIVE ADHESIVE AND USE THEREOF
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Application No.: US17632261Application Date: 2020-07-28
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Publication No.: US20220275250A1Publication Date: 2022-09-01
- Inventor: Ryoko ASAI , Naofumi KOSAKA , Yosuke SHIMIZU
- Applicant: NITTO DENKO CORPORATION
- Applicant Address: JP Ibaraki-shi, Osaka
- Assignee: NITTO DENKO CORPORATION
- Current Assignee: NITTO DENKO CORPORATION
- Current Assignee Address: JP Ibaraki-shi, Osaka
- Priority: JP2019-143392 20190802
- International Application: PCT/JP2020/028917 WO 20200728
- Main IPC: C09J7/38
- IPC: C09J7/38 ; C09J201/06 ; C09J11/06
Abstract:
Provided is a photo-crosslinkable PSA comprising a polymer having side-chain benzophenone structures. The photo-crosslinkable PSA is a cured product of a PSA composition comprising an ethylenically unsaturated compound and a benzophenone structure-containing component. The photo-crosslinkable PSA has VOC emissions of 500 μg/g or less. Also provided is a PSA sheet having a PSA layer formed from the photo-crosslinkable PSA.
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