Invention Application
- Patent Title: METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING
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Application No.: US17632632Application Date: 2020-07-29
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Publication No.: US20220276564A1Publication Date: 2022-09-01
- Inventor: Mir Farrokh SHAYEGAN SALEK , Rafael C. HOWELL , Yunan ZHENG , Haiqing WEI , Yu CAO
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2020/071449 WO 20200729
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method of simulating a pattern to be imaged onto a substrate using a photolithography system, the method includes obtaining a pattern to be imaged onto the substrate, smoothing the pattern, and simulating an image of the smoothed pattern. The smoothing may include application of a graphical low pass filter and the simulating may include application of edge filters from an edge filter library.
Information query
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