Invention Application
- Patent Title: VACUUM VALVE AND APPARATUS FOR FABRICATING SEMICONDUCTOR HAVING THE SAME
-
Application No.: US17543807Application Date: 2021-12-07
-
Publication No.: US20220282372A1Publication Date: 2022-09-08
- Inventor: Jaeheung LEE , Junseong PARK , Kanghun LEE , Seongwan KIM , Hyouncheol KIM
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2021-0028988 20210304
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/52 ; H01L21/67

Abstract:
A vacuum valve includes a valve flange having a first port, a second port, and a valve seat in a space between the first port and the second port, a valve body in the valve flange, the valve body having a contact surface facing the valve seat, and the valve body being moveable to have the contact surface contact the valve seat and to be separated from the valve seat, a disk on the contact surface of the valve body, the disk having an inclined surface inclined toward the second port, and an actuator connected to the valve flange, the actuator being configured to apply a driving force to the valve body to move the contact surface of the valve body into or out of contact with the valve seat.
Public/Granted literature
- US11946138B2 Vacuum valve and apparatus for fabricating semiconductor having the same Public/Granted day:2024-04-02
Information query
IPC分类: