Invention Application
- Patent Title: SCHOTTKY BARRIER DIODE AND METHOD FOR MANUFACTURING THE SAME
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Application No.: US17317576Application Date: 2021-05-11
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Publication No.: US20220285485A1Publication Date: 2022-09-08
- Inventor: Dae Hwan Chun , Junghee Park , Jungyeop Hong , Youngkyun Jung , NackYong Joo
- Applicant: HYUNDAI MOTOR COMPANY , KIA CORPORATION
- Applicant Address: KR Seoul; KR Seoul
- Assignee: HYUNDAI MOTOR COMPANY,KIA CORPORATION
- Current Assignee: HYUNDAI MOTOR COMPANY,KIA CORPORATION
- Current Assignee Address: KR Seoul; KR Seoul
- Priority: KR10-2021-0028699 20210304
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/872 ; H01L29/66

Abstract:
A Schottky barrier diode is provided. The Schottky barrier diode includes: an n+ type of substrate, an n− type of epitaxy layer disposed on a first surface of the n+ type of substrate and having a trench opened to an opposite side of a surface facing the substrate, a p type of region disposed on a side surface of the trench, a Schottky electrode disposed on the n− type of epitaxy layer and within the trench, and an ohmic electrode disposed on a second surface of the n+ type of substrate.
Information query
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