- 专利标题: Bismaleimide Compound, Composition Containing Same, Polybenzoxazole, And Semiconductor Device
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申请号: US17685604申请日: 2022-03-03
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公开(公告)号: US20220298281A1公开(公告)日: 2022-09-22
- 发明人: Naoki Kawamoto , Firyon Ko , Taihei Koumoto
- 申请人: Nippon Kayaku Kabushiki Kaisha
- 申请人地址: JP Tokyo
- 专利权人: Nippon Kayaku Kabushiki Kaisha
- 当前专利权人: Nippon Kayaku Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 优先权: JP2021-042386 20210316,JP2022-021273 20220215
- 主分类号: C08F222/40
- IPC分类号: C08F222/40 ; C08L79/08 ; C08J5/18 ; H01L21/027 ; H01L23/532 ; H01L23/29
摘要:
An object of the present invention is to provide a novel photosensitive resin precursor that can be developed with an alkali and ring-closed even at low temperatures, and preferably has excellent thermal properties and excellent electric properties after curing, and also to provide a use application thereof. As means for achieving the object, disclosed are a bismaleimide compound comprising, in one molecule, two partial structures in each of which a carbon atom having a substituent represented by the following formula (A) (wherein Y represents a direct bond or a divalent linking group), and a carbon atom having a hydroxy group are directly bonded to each other, a polymer which is a self-polymer of the bismaleimide compound, and a benzoxazole which is an intramolecular dehydrated ring-closed product of the polymer.
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