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公开(公告)号:US20240280902A1
公开(公告)日:2024-08-22
申请号:US18435588
申请日:2024-02-07
发明人: Naoki Kawamoto , Firyon Ko , Taihei Koumoto
IPC分类号: G03F7/031 , C07C215/80
CPC分类号: G03F7/031 , C07C215/80
摘要: A compound having unsaturated double bonds of formula (1):
wherein A1 represents a divalent linking group of formula (1-1), (1-2), or (1-3):
wherein ring a represents a benzene cyclohexane ring; X represents a direct bond or a divalent linking group; Z represents a monovalent substituent; p, q, and r are numbers of the monovalent substituent Z, p and q each independently represent an integer of 0 to 3, r represents an integer of 0 to 2,
or a divalent linking group other than formulae (1-1), (1-2), and (1-3), provided that at least one of A1 is a divalent linking group of formula (1-1), (1-2), or (1-3); A2 represents a divalent linking group; A3 represents a hydrogen atom or a methyl group; and n is an average value of the repeating unit numbers, and is a real number within a range of 1≤n≤9).-
2.
公开(公告)号:US20230305400A1
公开(公告)日:2023-09-28
申请号:US18107285
申请日:2023-02-08
发明人: Naoki Kawamoto , Firyon Ko , Taihei Koumoto
CPC分类号: G03F7/0395 , C08L77/10 , C08L2203/16 , C08L2203/206
摘要: An object is to provide a novel bismaleimide compound. The solution is a bismaleimide compound represented by formula (1):
wherein A1 represents a direct bond, a divalent linking group represented by formula (1-1), (1-2), or (1-3):
wherein ring a represents a benzene ring or a cyclohexane ring; X represents a direct bond or a divalent linking group; Z represents a monovalent substituent bonded to ring a; p, q, and r are the number of substituents Z, p and q represent an integer of 0 to 3, and r represents an integer of 0 to 2; or a divalent linking group other than this; at least one of a plurality of A1s is a divalent linking group represented by formula (1-1), (1-2), or (1-3); A2 represents a divalent linking group obtained by removing two carboxy groups from an aromatic dicarboxylic acid compound; Y represents a divalent linking group; and n is an average value of the number of repeating units and is a real number in a range of 1 to 100.-
3.
公开(公告)号:US20230250233A1
公开(公告)日:2023-08-10
申请号:US18107286
申请日:2023-02-08
发明人: Naoki Kawamoto , Firyon Ko , Taihei Koumoto
IPC分类号: C08G73/22 , C07D207/452 , G03F7/039 , H01L23/29
CPC分类号: C08G73/22 , C07D207/452 , G03F7/039 , H01L23/293
摘要: An object is to provide a novel bismaleimide compound. The solution is a bismaleimide compound represented by formula (1):
wherein A1 represents a direct bond, a divalent linking group represented by formula (1-1), (1-2), or (1-3):
wherein ring a represents a benzene ring or a cyclohexane ring; X represents a direct bond or a divalent linking group; and Z represents a monovalent substituent; or a divalent linking group other than this; at least one of a plurality of A1s is formula (1-1), (1-2), or (1-3); A2 represents a divalent linking group that is a residue of a saturated aliphatic dicarboxylic acid compound, a divalent linking group that is a residue of an aromatic dicarboxylic acid compound, or a divalent linking group other than this; and when A2 is present singly, A2 is a divalent linking group that is a residue of a saturated aliphatic dicarboxylic acid compound, and when a plurality of A2s is present, at least one of A2s is a divalent linking group that is a residue of a saturated aliphatic dicarboxylic acid compound.-
4.
公开(公告)号:US11905356B2
公开(公告)日:2024-02-20
申请号:US17685604
申请日:2022-03-03
发明人: Naoki Kawamoto , Firyon Ko , Taihei Koumoto
IPC分类号: C07D207/24 , C08F222/40 , C08L79/08 , C08J5/18 , C07D207/22 , H01L23/532 , H01L23/29 , H01L21/027 , C08F122/40 , C08F22/40 , C08F236/14
CPC分类号: C08F222/408 , C07D207/22 , C07D207/24 , C08J5/18 , C08L79/085 , C08F22/40 , C08F122/40 , C08F222/40 , C08F222/404 , C08F222/406 , C08F236/14 , C08J2379/08 , H01L21/0271 , H01L23/293 , H01L23/5329
摘要: An object of the present invention is to provide a novel photosensitive resin precursor that can be developed with an alkali and ring-closed even at low temperatures, and preferably has excellent thermal properties and excellent electric properties after curing, and also to provide a use application thereof. As means for achieving the object, disclosed are a bismaleimide compound comprising, in one molecule, two partial structures in each of which a carbon atom having a substituent represented by the following formula (A) (wherein Y represents a direct bond or a divalent linking group), and a carbon atom having a hydroxy group are directly bonded to each other, a polymer which is a self-polymer of the bismaleimide compound, and a benzoxazole which is an intramolecular dehydrated ring-closed product of the polymer.
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5.
公开(公告)号:US20220298281A1
公开(公告)日:2022-09-22
申请号:US17685604
申请日:2022-03-03
发明人: Naoki Kawamoto , Firyon Ko , Taihei Koumoto
IPC分类号: C08F222/40 , C08L79/08 , C08J5/18 , H01L21/027 , H01L23/532 , H01L23/29
摘要: An object of the present invention is to provide a novel photosensitive resin precursor that can be developed with an alkali and ring-closed even at low temperatures, and preferably has excellent thermal properties and excellent electric properties after curing, and also to provide a use application thereof. As means for achieving the object, disclosed are a bismaleimide compound comprising, in one molecule, two partial structures in each of which a carbon atom having a substituent represented by the following formula (A) (wherein Y represents a direct bond or a divalent linking group), and a carbon atom having a hydroxy group are directly bonded to each other, a polymer which is a self-polymer of the bismaleimide compound, and a benzoxazole which is an intramolecular dehydrated ring-closed product of the polymer.
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