Invention Application
- Patent Title: CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
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Application No.: US17633176Application Date: 2020-08-20
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Publication No.: US20220301811A1Publication Date: 2022-09-22
- Inventor: Wei FANG , Lingling PU , Bo WANG , Zhonghua DONG , Yongxin WANG
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2020/072332 WO 20200820
- Main IPC: H01J37/22
- IPC: H01J37/22 ; H01J37/244 ; H01J37/28 ; G01N23/2251 ; G06T5/00 ; G06T5/50

Abstract:
An improved apparatus and method for enhancing an image, and more particularly an apparatus and method for enhancing an image through cross-talk cancellation in a multiple charged-particle beam inspection are disclosed. An improved method for enhancing an image includes acquiring a first image signal of a plurality of image signals from a detector of a multi-beam inspection system. The first image signal corresponds to a detected signal from a first region of the detector on which electrons of a first secondary electron beam and of a second secondary electron beam are incident. The method includes reducing, from the first image signal, cross-talk contamination originating from the second secondary electron beam using a relationship between the first image signal and beam intensities associated with the first secondary electron beam and the second secondary electron beam. The method further includes generating a first image corresponding to first secondary electron beam after reduction.
Public/Granted literature
- US12080513B2 Cross-talk cancellation in multiple charged-particle beam inspection Public/Granted day:2024-09-03
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